Used SEZ / LAM RESEARCH 101 #293652614 for sale

SEZ / LAM RESEARCH 101
ID: 293652614
Wafer Size: 4"-6"
Spin etcher, 4"-6" Chamber.
SEZ / LAM RESEARCH 101 is a high precision, wafer-level etcher/asher equipment used in the semiconductor manufacturing process. The system is a three-stage, high-throughput, self-cleaning etcher/asher unit, featuring a fully automated wafer cassette-to-cassette process. The unit is capable of producing a minimum etch depth of 5 angstroms (Å) and a minimum asher depth of 0.2 microns, while providing both consistent and repeatable results. The machine enables accurate and precise etching and ashing of both stacked wafers and individual wafers with no human interaction. The tool utilizes a gas shaft to blow-dry the wafers before depositing the etching gas (it is ideal for protection layer etching and high-density plasma etching). The asset can produce a broad range of etch and asher profiles, including isotropic, step, anisotropic, selective, and deep-etch profiles. It can also be used to perform inertial and non-inertial etching/ashing. The model utilizes an Upstream/Downstream N2 purge equipment, allowing users to control the exposure of reactive gases to the wafer(s). The system is equipped with a Programmable Logic Controller (PLC), providing precise control over vital process parameters such as the temperature, pressure, and flow rates of the reactants. The PLC is also capable of storing a library of up to 256 wafer recipes, which can be quickly loaded and executed without any intervention from the user. The unit also features large LCD touch screen and intuitive graphic interface, which allows operators to monitor machine status and check each wafer as it passes through the unit. This ensures high quality and consistent etching / ashing results multiple times. The tool also provides comprehensive diagnostics and reporting capabilities, which is very helpful for users to quickly analyze and identify issues with the asset.
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