Used SEZ / LAM RESEARCH 101 #293758270 for sale

SEZ / LAM RESEARCH 101 is an etcher/asher, a type of chemical etching and etching-lane selective removal equipment. It is commonly used for the processing of small features, especially in the microelectronics, semiconductor, and photovoltaics industries. SEZ 101 offers a high precise, reproducible, and flexible system for the etching of materials including semiconductors, metals, polymers, and oxide films. The unit consists of three tightly integrated components: a process chamber, a precision control unit, and an etch head. The process chamber provides the enclosed environment necessary for the etching operation and contains a powerful exhaust machine to remove any produced etch residues. The precision control unit contains the necessary programming, heating, and control to enable precise etching of the material. Finally, the etch head provides the ability to accurately control the amount of power and current applied to the substrate to selectively etch the patterns. LAM RESEARCH 101 features a powerful, fast, yet precise etch engine capable of producing feature sizes down to 25 nanometers. The tool contains a state of the art filtering asset that ensures that etch particles of any size are expelled from the vacuum chamber, maintaining a high quality environment. Additionally, the etch model provides the ability to precisely pattern materials and features that can be used for contact, metallization, and isolation applications. Due to its flexibility and precise etching capabilities, 101 is used in the production of integrated circuits, solar cells, and microelectromechanical systems, as well as for advanced research applications. The equipment is also capable of supporting multiple processes and workflows for different substrates, materials, and applications. Additionally, the system offers excellent line of sight imaging capabilities, allowing for non-destructive evaluation of the etch patterns before and after the etching process. Overall, SEZ / LAM RESEARCH 101 is an advanced etch unit offering a powerful, precise, and flexible solution for etching a variety of materials used in the microelectronics and semiconductor industries. It is a reliable and economical tool used for advanced research and production applications.