Used SEZ / LAM RESEARCH 101 #9246714 for sale

SEZ / LAM RESEARCH 101 is an etcher / asher, designed and manufactured by SEZ. This is a thermal chemical processing equipment designed to quickly and precisely etch, deposit and planarize substrates with high precision and accuracy. The system is built on an inert gas atmosphere and temperature-controlled platform featuring energy-to-work isolation and control. SEZ 101 employs a series of process modules to realize etched and ashed components. This includes an interface chamber, an etching/ashing chamber, and a coolant module. The unit offers a range of programmable parameters such as temperature, flow rate, pressure, and time. The temperature is maintained at pre-defined levels to deliver consistent etching of substrates. The etching / ashing chamber is the key component of the machine. It has multi-zone air-cooling and temperature uniformity (32°F across 1.7 x 1.7") to ensure uniform thermal and chemical treatment of substrates. This chamber is also equipped with high rate plasma source and shielding. To ensure uniform etching, a frequency-stabilized RF source is used for plasma activation. The interface chamber is used to provide vacuum during substrate heating and airflow control. It is fitted with an ion source that ensures uniform etching rates. The coolant module is designed to ensure consistent cooling of the etching / ashing chamber and substrate. It is equipped to maintain temperature at pre-defined levels. A programmable gas inlet and outlet provides uniform gas flow in the process chamber. LAM RESEARCH 101 is a flexible etching / ashing tool, capable of working with a variety of substrates, including gold, aluminum and silicon. With its high etching rates, excellent uniformity and repeatability, 101 is an efficient solution for many etching and ashing processes. The asset is ideal for a wide range of applications, ranging from MEMS manufacturing to prototyping.