Used SEZ / LAM RESEARCH 201 #9024121 for sale

SEZ / LAM RESEARCH 201
ID: 9024121
Etcher.
SEZ / LAM RESEARCH 201 is a top of the line etching/ashing equipment designed to provide high-quality results in a quick and efficient manner. It features a one-piece design that conserves space while delivering the precision needed to fabricate desired shapes and patterns. The system is comprised of two modules: the etcher and the asher. The etcher is designed to remove oxides to expose metal surfaces for resistance etching, creating a high level of precision. This is achieved through the use of reactive gases that are directed onto the substrate. By providing an adjustable pressure and temperature unit, this module is able to meet the requirements of various materials and layers. The asher module facilitates the processes of metal deposition and insulator patterning with HF-based gas plasmas. This module is ideal for fine-feature patterning as it maintains an even level of power concentration throughout the etch for precision cutting and etching. Additionally, this module's precision allows it to craft intricate details in various coatings. SEZ 201 model of the machine provides users with a fully integrated solution featuring a self-contained etching station, high speed RF generator, software-driven data acquisition, and precise pellet generators. With a wide variety of gas type and pressure settings, the tool has been designed to easily handle a range of projects from basic processes to complex designs. This asset also includes a user-friendly GUI that provides digital readouts and speedy model adjustments for rapid setup times. Additionally, the 301 also features a self-clean feature, which prevents contamination from build-up and enables high-quality etching and ashing results. LAM RESEARCH 201 is the ideal equipment for both industrial and laboratory operations, as its one-piece design and advanced features provide convenience and accuracy. Its two modules allow users to quickly attain detailed results while ensuring an optimum level of quality.
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