Used SEZ / LAM RESEARCH 203 #9246715 for sale

SEZ / LAM RESEARCH 203 Etcher / Asher is a state-of-the-art, advanced etching machine used to create patterns and circuits on semiconductor wafers. It is similar to a traditional etcher, in which a thin film of either photoresist or oxide is applied to the surface of the wafer before a desired pattern is etched into it. However, the RESEARCH SEZ 203 is equipped with a unique laser-assisted etching equipment, which allows for better accuracy, precision, and complexity of designs. The RESEARCH LAM RESEARCH 203 is designed for high-volume, high-precision production operations and comes with an advanced optics, software, and chamber setup that enable a wide variety of etching parameters. It features laser-assisted in-situ endpoint detection (LIPED) and support for advanced data monitoring and control. To create patterns, the machine starts by applying the desired photoresist or oxide film to the wafer, then uses a laser beam to create the desired pattern. The pattern can then be programmed into the machine's laser controller, which controls the laser beam's movement, intensity and power to map out the desired pattern. The beam is routed through a series of energy-modulated optical elements, which direct it to the photomasked region of the wafer. Once the pattern has been mapped out, the laser beam is then focused onto the workpiece, selectively removing the photoresist or oxide film in a controlled environment optimized for clean work results. The RESEARCH 203's system also boasts an advanced automated cleaning unit that ensures clean working conditions before each process run, thus further improving accuracy and repeatability of results. To reduce the chemical and material waste, the machine also features a bypass machine that eliminates the need for air and/or inert gases when working with polymers not requiring such techniques. The RESEARCH SEZ / LAM RESEARCH 203 is highly versatile and can be used to create wide variety of patterns and features on all major semiconductor materials. It is an ideal solution for both large-scale production operations and research institutions looking for advanced etching capabilities.