Used SEZ / LAM RESEARCH 203 #9246716 for sale

SEZ / LAM RESEARCH 203 is an etcher/asher which is used in both semiconductor fabrication and research & development environments. Featuring a linear E-beam (LEB) source, this precision equipment is designed to etch features with consistent profile, aspect ratio, and depth. In addition, the system may be used to produce high-speed, short-pulse cleaning of semiconductor surfaces. Featuring an open-frame configuration, SEZ 203 is equipped with field-replaceable components for easy maintenance. This ensures maximum up-time and allows for equipment reconfigurations as needed. The LEB source comprises three main components - an electron gun, beam shaping electrodes, and magnetic field-generating coils. This design allows for automated pulsed gas delivery, allowing for precise process control. Two gas injectors may be added to the LEB source to inject a second plasma gas for additional etching capabilities. This etcher/asher is programmed through the simple to use Process Create PC software package. The software allows users to develop and save recipes, while providing real-time process monitoring. All recipes may be stored in the unit's memory for future use. Additionally, LAM RESEARCH 203 also offers users an integrated recipe management machine to facilitate the exchange of recipes among multiple systems. When used as an etcher, 203 produces sub-micron resolution features through the use of its finely controlled electron beam. Additionally, the tool is also fitted with an advanced substrate turner, making it ideal for multi-layer etching across large arrayed substrates. This turner is also capable of executing automated recipes based on custom parameters and user-defined tolerances. When used as an asher, SEZ / LAM RESEARCH 203 asset is capable of short pulse, high-speed cleaning of advanced semiconductor surfaces. This removes contaminants from the surface of devices to aid in the production of higher performing designs. In addition to traditional ashing, this model is able to utilize variable speed motor controllers to decrease both the cycle time and the roughness of the ashed surface. In conclusion, SEZ 203 is an advanced etcher/asher able to serve a variety of needs. Featuring a precision LEB source, automated gas delivery, an integrated recipe management equipment, and a substrate turner, this system is well-equipped to handle challenging etching and ashing processes. With its easy to operate design, LAM RESEARCH 203 is a great choice for organizations with complex etching and ashing needs.