Used SEZ / LAM RESEARCH 203 #9246718 for sale

SEZ / LAM RESEARCH 203 etcher / asher is a high-quality etching and ashing tool designed for the semiconductor industry. This etcher is designed for etching and ashing of semiconductor materials such as silicon, germanium, indium arsenide, gallium arsenide and boron nitride. It can handle wafers up to 8 inches in diameter and has a robust, computer-controlled system to ensure accurate etching and ashing of substrates. SEZ 203 utilizes the etch/ashers process to create circuits on the wafer. Etching is the process of removing a thin layer of the substrate layers, while ashing is the process of removing an oxide layer from the substrates. The etcher/asher uses a combination of plasma immersion ion implantation and reactive ion etching (RIE) to achieve the desired results. It also has the capability to deposit films by using gas activated chemical vapor deposition (GACVD) and electrochemical deposition (ECD). LAM RESEARCH 203 also has a variety of safety features, including an inert gas chamber, exhaust baffles, and a chemical delivery system. The inert gas-filled chamber prevents the possibility of hazardous chemicals from coming into contact with the wafer. The exhaust baffles help to keep the etching and ashing vapors away from the operator. The chemical delivery system also maintains consistency and accuracy of the etching and ashing process. 203 is a reliable and cost-efficient etching and ashing solution for the semiconductor industry. Its features ensure accurate etching and ashing as well as safety for the user. It is easy to operate and maintain, making it an ideal choice for any etching and ashing application.