Used SEZ / LAM RESEARCH 203 #9399002 for sale

SEZ / LAM RESEARCH 203
ID: 9399002
Wafer Size: 8"
Spin etcher, 8".
SEZ / LAM RESEARCH 203 Asher is a versatile batch processing wafer etcher tool. Featuring a Plasma Enhanced Chemical Vapor Deposition (PECVD) process, the Asher has been specifically designed for etching and cleaning high temperature sensitive materials such as silicon carbide, gallium arsenide, and sapphire. Ideal for use in semiconductor fabrication, SEZ 203 uses a combination of pressure, temperature, and chemistry to clean, etch or masking of the work-piece. The Asher's process chambers are pressurized with a high quality vacuum and then heated up to reduce or clarify contaminants from the process. The flow rate is automatically monitored, allowing for precision control over the etching rate. Multiple process recipes are stored for easy access, giving consistent etching results no matter the material. As well, all process parameters may easily be adjusted via the large touch display, allowing for quick tailoring to specific requirements. The Asher's advanced diagnostics maximize performance and security. Through its integrated laser interferometer and photodiode array, the Asher aligns substrates with nanometer level accuracy in both x and y directions. The laser also features includes a contamination monitor, which utilizes the laser interferometry to detect and measure any impurities present in the etching chamber. This ensures security and quality of the process while minimizing scrap. The Asher also has a number of environmental features. It meets the UL green labelling system standard for hazardous materials, meaning that it is free from or limits exposure to hazardous materials, such as ozone and other Volatile Organic Compounds (VOCs). Additionally, it is equipped with a safety door which prevents unexpected start up or process interruption. The Asher is also designed to minimise noise, keeping acoustic levels to a minimum. In summary, LAM RESEARCH 203 Asher is a highly efficient, cost-effective, batch processing etcher suitable for high-temperature sensitive materials. Its automated process recipes and advanced diagnostics with nanometer level accuracy ensure consistent results while its environmental controls help make it a safe and secure device.
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