Used SEZ / LAM RESEARCH 223 #293775128 for sale

SEZ / LAM RESEARCH 223 is an advanced etching and ashing equipment engineered for high performance wafer processing. The system is designed to be a flexible solution for both ashing and etching applications with the goal of significantly lowering cycle times and offering superior process control. It features standalone or automated operation for both complete wafer processing and partial wafer processing applications, with a wafer-to-wafer consistency of less than 5%. The unit also offers superior process scalability between full wafer and partial wafer etching and ashing processes. SEZ 223 includes an efficient, scalable process chamber with an advanced Computer Automated Process Control (CAPC) machine for full wafer or partial wafer process control. It is designed to provide highly accurate and repeatable etching and ashing results without operator intervention. The chamber design includes a 200mm wafer platen with two NO FAB® floating support arms for optimal processing of smaller substrates. It has a chamber volume of 3300 liters, with an adjustable gas distribution tool for in situ oxidation protection and tunable flows ratios for etching and ashing control. LAM RESEARCH 223 includes an advanced closed loop asset with a real-time wafer temperature monitoring and an MFC by pressure loop control module. This model serves to accurately control the deposition and etch rate to generate consistent and repeatable results. In addition, the equipment is equipped with a dedicated, integrated cleaning system for complete etch/ash clean-up between individual wafer processes. This unit includes a two-step approach that involves a DI water rinse, then a nitrogen directed purge and plasma to ensure a complete clean-up of the chamber. 223 also includes a CORE Automation® software suite to ensure accurate process parameter settings and adherence. This versatile software allows the user to automate process setup, execution, transfer and tracking. It also features reliable batch processing and distributes the workload across multiple systems. Overall, SEZ/LAMS RESEARCH SEZ / LAM RESEARCH 223 is an advanced etching and ashing machine designed to minimize cycle times, improve process control and consistency, and achieve reliable results. With its comprehensive and advanced features, this tool offers reliable etch/ash solutions suitable for varied applications.