Used SEZ / LAM RESEARCH 300 #9211251 for sale

SEZ / LAM RESEARCH 300
ID: 9211251
Single wafer etcher.
SEZ / LAM RESEARCH 300 is a top-of-the-line, no-compromise, dry etcher (also known as an asher). Built for precision and speed, it is capable of performing high-precision, fast etching of metals and insulating material on a wide variety of substrates. This top-of-the-line model is designed for high throughput processing for full wafer sizes (up to 12-inch) for most of the metals and insulating materials. This system is engineered for process consistency and repeatability. SEZ 300 comes with an advanced control console with real-time process parameters monitoring. It also has various options for automation and record functions that help in making time-to-time comparison. It also allows users to design their own recipes to apply for their own etching processes. The heart of SEZ/LAMLAM RESEARCH 300 is its sealed, pitch-set exterior coating—an advanced combination of silicones, plastics, and ceramics that is designed to keep the unit free of dust and contaminants, and boosts its anti-corrosion armor to protect the interior components from corrosive threats. The etcher features a plasma chamber with an optimized transition from small plasma source to process area maximizes etching efficiency and effectiveness. 300 also comes with a cold-wall wall-pipe substrate loading system with vacuum-interlocked safety door, and an enclosed low particle processing environment. The process chamber is ergonomically designed to fit various etch rates and pressure levels according to customer needs. It is designed for use with both single-wafer and batch-sized substrates. The chamber is superactive and can be loaded and unloaded in seconds for improved throughput and repeatability. As an etcher, SEZ / LAM RESEARCH 300 offers strategies like step etching and reactive ion etching. As a complement to its etching capabilities, SEZ 300 also offers additional services such as layering, planarizing, studding and backlapping. LAM RESEARCH 300 also features a variety of process parameters to adjust deposition, stress, rate, temperature, and surface roughness for optimal conditions for different materials. In conclusion, 300 is a top-of-the-line etcher/asher designed for high throughput processing with minimal downtime. It is a reliable, precise, and repeatable tool designed for precision etching of most metals and insulating materials on a variety of substrates quickly and accurately. Its advanced features, automation capabilities, and ergonomic design make it the perfect tool for the most demanding applications.
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