Used SEZ / LAM RESEARCH 304 #293643887 for sale

SEZ / LAM RESEARCH 304 is a high-performance piece of wet-processing equipment designed for etching, deposition and other related operations. Its flexibility and versatility make it an excellent etcher for a wide range of applications including microelectronics, photonics, medical devices and more. It has been designed to use multiple types of process chemistry, with each recipe tailored to meet specific materials, cleaning and etching parameters. At its core, SEZ 304 is a batch wet etcher that uses an acid solution to attack the surface of a substrate, like silicon oxide. It has a pressure-compensated gas injection equipment which eliminates the need for base recirculation, making it ideal for rapid prototyping of samples in the lab. The etcher is housed in a 303 stainless steel chamber with a recirculating filtration system that removes particles and other contaminants before they reach the surface of the substrate. Inside the chamber, LAM RESEARCH 304 features a high-accuracy, x-y positioning unit that provides fast, precise alignment of the blades. Along with an advanced dynamic flow valve, this machine delivers precise and consistent process chemistries with minimal wastage or buildup. The etcher also has an innovative magnetic tooling tool that makes substrate placement and removal simpler and easier than ever before. The etcher can process materials up to 9.9" in diameter, with a maximum thickness of 6.4mm and a maximum weight of 3.1kg. 304 is easily integrated into existing fabrication and production processes, and its modular design ensures it can quickly and easily be adapted to meet specific requirements. In addition to its etching capabilities, the etcher can also be used in a variety of other processes such as deposition, thin film growth, lithography and insulation applications. With its reliable and versatile operation and outstanding performance, SEZ / LAM RESEARCH 304 is an ideal and cost-effective solution for any etching, deposition or related wet process.