Used SEZ / LAM RESEARCH 304 #293652616 for sale

SEZ / LAM RESEARCH 304 is a plasma etching / ashing equipment for the production of high-quality patterned microstructures at high throughput rates. It is capable of etching substrates in various materials such as silicon, glass, metals and nitride and has a wide range of applications in the microelectronics industry. Its features and capabilities provide the highest quality and repeatable results for the manufacturing of products. SEZ 304 features an automated robotic system which allows for easy handling of the substrate. This automated process allows for optimized exposure time, which results in repeatable, accurate etching results. The unit also offers a high degree of accuracy and control, with the ability to control the etch rate, while providing uniformity across the substrate. The machine is also capable of producing patterns that are free of any artifacts or run-off effects. The tool is also equipped with an advanced Plasma Source which provides a high level of performance and accuracy. This advanced source produces high-density plasma which is then directed to the substrate through the etch chamber. This high-density plasma results in optimized etch rates which translate to higher quality etched structures. LAM RESEARCH 304 also features a multi-zone process chamber which allows for sequential etching of multiple substrates in various materials. This asset allows for control over the etch process parameters. The model also features a sophisticated gas delivery equipment which is used to control the etch rate, and has the ability to process various etch chemistries. 304 is also equipped with advanced diagnostics, including an integrated Edge Imaging Profiler which provides sub-micron resolution imaging of the edge of the patterned etch profile. This system also offers in-situ monitoring which allows for optimizing of process parameters ensuring the highest quality results. SEZ / LAM RESEARCH 304 offers the capability to produce high-quality and repeatable etched microstructures with high throughput rates, leading to improved production throughput rates and ultimately greater efficiencies in production lines. Its features and capabilities provide the highest quality and repeatable results for the manufacture of products.