Used SEZ / LAM RESEARCH 305 #293652618 for sale
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ID: 293652618
Wafer Size: 8"-12"
Vintage: 2006
Spin processor, 8"-12"
Chamber
2006 vintage.
SEZ / LAM RESEARCH 305 is a high-precision etcher, or asher, designed for the fabrication of thin-film structures. This device features a high-power hydrogen fluoride gas source that can be used for wet isotropic etching. It is also equipped with a pump system that allows for rapid reaction chamber evacuation, enabling accurate and rapid etching of both metal and organic dielectrics. SEZ/LAM can etch structures down to 0.5 microns in size. This makes it ideal for creating nanopatterns or other high-resolution circuitry on electronic devices. The asher also allows for selectivity etching, which means it can etch certain materials more slowly than others. For example, silicon oxide can be etched at a rate of 1 micron per minute, while other materials can etch at 10 microns per minute. This helps to ensure precise fabrication of complex structures. LAM RESEARCH/LAM is extremely user friendly. It features an intuitive touch-screen interface that allows users to easily adjust etching times and parameters. When compared to older, more complicated etchers, the user-friendly operation of SEZ / LAM RESEARCH/LAM is a distinct improvement. The device also includes a programmable robotic loader that can hold up to five substrates at a time. This makes it easy to conduct multiple processes in parallel and saves time and money. In terms of safety, SEZ 305 is extremely reliable. It features a triple valve system to keep process chemicals away from the environment. Additionally, it uses a recirculating pump that maintains a constant flow. This minimizes the buildup of harmful chemicals. All in all, LAM RESEARCH 305 is an excellent etcher for thin-film fabrication. Its combination of high accuracy, user-friendly operation, and enhanced safety makes it an ideal choice for a variety of industrial and research applications.
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