Used SEZ / LAM RESEARCH DV-34 #293754182 for sale

SEZ / LAM RESEARCH DV-34
ID: 293754182
Wafer Size: 8"- 12"
Single wafer etcher, 8"- 12" (4) Chambers.
SEZ / LAM RESEARCH DV-34 is an etcher/asher designed for processes requiring precision etch over large areas. It is particularly designed for semiconductor wafer, metal, and glass etching applications, which help to speed up process times while ensuring tight tolerance accuracy. It is enabled by a unique design which includes multiple process modules, each featuring a 'ring' supply equipment for process slurries or organic/aqueous chemistries. This helps to deliver the chemistries in a stable and uniform manner over the entire area of the wafer or other materials being processed. Due to its ring supply system, SEZ DV-34 can achieve process times up to 40% faster than traditional systems. It also ensures close process control and repeatability, which is critical for high-quality microfabrications. As it can process large areas, the etcher is capable of optimizing material etching through uniformity over the whole substrate surface. Additionally, the unit includes automated end-point detection features, allowing it to accurately monitor the etch progress throughout the process. The machine includes automated features, such as the ability to regulate the exhaust and replaceable gas line, all of which enable it to proactively optimize etch profiles. The tool ensures consistent slurries throughout the process, while minimizing variability in silicate deposition and other parameters. It also helps to minimize contaminations due to its exhaust filter asset and closed-loop environment. Overall, LAM RESEARCH DV-34 is a versatile etcher/asher specifically designed to achieve the highest quality etching process across a large substrate area. It is an ideal choice for microfabrications requiring tight tolerance accuracy and repeatability, as it can deliver uniform and optimized etching throughout the substrate. The model utilizes sophisticated components, which help to ensure reliable and consistent performance throughout the process. As such, it is an effective choice for etch processes requiring precise results with close process control.
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