Used SEZ / LAM RESEARCH DV-34 #293754183 for sale

SEZ / LAM RESEARCH DV-34 etcher/aser is a powerful, dependable, and cost-efficient dry etching equipment designed for use in Volume and PML clean production applications. The system offers superior etch quality and homogeneity achieved through optimized plasma uniformity. It excels in all etch steps and is also suitable for oxide, nitride, polyimide, and metals, including tungsten and aluminum. The versatile tool set also enables etch of precise topography features such as strings, slots, and posts. This advanced dry etcher is capable of working across temperature ranges from 0-750ºC and with multiple etch chemistries including Oxygen, Chlorine, Floursilane, and Carbon Tetrafluoride. The unit also has high power RF with customizable top-down and bottom-up plasma control for etch modifications as needed, and is equipped with easy to use remote operation console for plasma uniformity control. Cost and running efficiency are improved with optional tight-bellowed quartz single-wafer presence sensor and automated exhaust to maintain consistent etch house performance. SEZ DV-34 etcher is designed with extensive hardware redundancy built in for maximum uptime and highest reliability with minimal maintenance. The 3G/4G/5G Plasmalab chamber is designed for cleaning dozens of wafers in a single load and is capable of providing excellent temerature homogeneity. It is compatible with both robust and delicate PECVD films and is offered with optional BPSG interlevel support. It also has an integrated heat/map bake stage, with ultra-flat hotplates for process enhancements and temperature uniformity control. The etcher is designed to adhere to strict export control regulations and includes a number of process verification options to ensure accuracy and repeatability. It is also equipped with an innovative wafer tracking machine so users can quickly locate their wafers for quick retrieval. The entire unit is subjected to high cycle-to-cycle stability tests to increase process control. LAM RESEARCH DV-34 is a powerful dry etcher that represents an ideal solution for demanding etch and clean production risks. It is robust and cost-efficient with high plasma uniformity, excellent etch quality and homogeneity, plus extensive hardware redundancy that ensures uptime and reliability. It is also designed to adhere to export regulations and is equipped with an innovative wafer tracking tool.