Used SEZ / LAM RESEARCH DV-38DS #9040754 for sale
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ID: 9040754
Wafer Size: 12"
Vintage: 2006
Wet station, 12"
Frontside handling
(8) Chambers
Number of chemistry: 1
Operator cassette loading
Overhead transport system (OHT)
Through the wall
Front machine section:
Robot & controller
Main PC condition
Hard drive for IC/TC
Front FFU
Buffer station
(3) Load ports
Load port access: Light curtain
Asyst ISO port
Carrier ID reader
Asyst Advan-Tag
E 84 Parallel I/O
Front handling system: ECO end-effector, ceramic
Rear machine section:
ECO
FFU
Control cabinet
Left process section
(3) PSL: Process chamber, Chuck, Spindle unit, Dispenser motors
(1) PSL: Process chamber, Chuck, Spindle unit, Dispenser motors, Regulators, MFCs, Pump valve and chemistry lines
Right process section
(3) PSR: Process chamber, Chuck, Spindle unit, Dispenser motors
(1) PSR: Process chamber, Chuck, Spindle unit, Dispenser motors, Regulators, MFCs, Pump valve and chemistry lines
Components included
ATMI
AC Rack
DVR
Exhaust line kit
IPA module
Liquid Chemistry cabinet 1:
Media 1 supply: Filtration system and sampling port
Buffer option A1: Medium, PZ10 spiking pump
Buffer option B1: No medium
Paddle wheel
DI water
Inline cooler for temperature control
Flowmeter
Liquid Chemistry cabinet 2:
Media 2 supply: Medium / Temperature
Buffer option A2: Medium, PZ10 spiking pump
Buffer option B2: No medium
Paddle wheel
Horiba CM-210 chemical analyzer: (2) Process loop, (2) Preparation loop
Flowmeter for DI water
Gas supply
CO2 Injection: No
Overall features:
White light
Transparent windows
Transformer 208V/400V CE
Frame
Leak sensor box
Submodules:
Process chamber display
Digital video recording
Currently de-installed
2006 vintage.
SEZ / LAM RESEARCH DV-38DS is an etcher/asher equipment specifically designed for etching and ashing photoresist and other residues on a variety of substrates. SEZ DV-38DS system offers fast, high-precision etching and ashing, with low-temperature processes and short processing times. LAM RESEARCH DV-38DS unit uses the latest semiconductor technologies such as chemical reactive ions for etching, and lamps and laser sources for ashing. It is capable of processing over a wide range of wafer sizes, from 4" to 12". The machine is designed to provide uniform, high-quality coverage for various substrates including silicon, oxides, metals, and ceramics. DV-38DS tool consists of two parts - the tool itself and the associated control asset. The tool is a compact, fully automated model that is designed for ease of use and efficient operation. It includes a high-performance feeder for loading and unloading wafers, a high-performance etching chamber for etching photoresist and other residues, and an ashing chamber for fusing layers. The etching chamber and the ashing chamber are both equipped with advanced thermal control systems to ensure optimal processing results and uniform coverage. The control equipment is designed to provide the user with precise control over SEZ / LAM RESEARCH DV-38DS system. The unit is equipped with an intuitive user interface, which allows users to make changes to their processes in a few clicks. The user interface enables users to set up the machine and to check on the tool's status in real-time. In addition, the control asset can be linked to a remote computer, allowing for easy remote access to the model's diagnostic data. SEZ DV-38DS equipment is designed for both low volume and high volume operations. Its advanced control system can be easily modified to fit a variety of processing tasks. In addition, the unit is designed with various safety features, such as emergency shut off, to ensure the safety of its operators and equipment. Overall, LAM RESEARCH DV-38DS is an advanced etcher/asher machine specifically designed for etching and ashing photoresist and other residues on a variety of substrates. Its advanced control tool allows for precise control and its intuitive user interface makes it easy to set up and operate. The asset's safety features ensure the safety of its operators and equipment, and its high-performance feeder enables efficient loading and unloading of wafers, making DV-38DS a great choice for a variety of etching and ashing processes.
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