Used SEZ / LAM RESEARCH DV-38F #9022266 for sale
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ID: 9022266
Vintage: 2007
System, parts machine
Chemical supply module
Missing parts: robot, stage, computer
Type: CBM-Type B
Position 1: LD, ULD Ports
Robot (Transfer unit): RBT (RS-8240)
Ionizer: Controller model 5024
Position 2: Buffer station
Robot (Transfer unit): Dual ECO Gripper left/right
Robot arm: Al anodized
Ionizer: AeroBar model 5285 (e)
Horiba HF monitor CM-210
Position 3, 4, 5, 6, 7, 8, 9: PMR1-PMR4, PML1-PML3
Robot (Transfer unit): Rear machine handling - (Twin ECO gripper)
Chamber material: PP
Chamber shape: Ring type
Chamber chuck material: PVDF / PETP / Stainless steel
Robot arm: PVDF (Pins), PETP (Assembly)
Chamber lower section: PP
Chemical supply piping: PFA
Drain piping: PVDF
Chamber cleaning: DIW
Ionizer: QuadBar 4630-DS
ABB Protronic 500 Temp controller: in-line heater controller
Position 10: PML4
Robot (Transfer unit): Rear machine handling - (Twin ECO gripper)
Chamber material: PP
Chamber shape: Ring type
Chamber chuck material: PVDF / PETP / Stainless steel
Robot arm: PVDF (Pins), PETP (Assembly)
Chamber lower section: PP
Chemical supply piping: PFA
Drain piping: PVDF
Chamber cleaning: DIW
Trebor 110R Pump
Entegris 0.03um Filter
Quickchange disposable filter QCDYATMTF Housing
Ionizer: QuadBar 4630-DS
Position 11: CHC1L
Chamber material: PP
Chamber chuck material: PVDF / PETP / Stainless steel
Robot arm: PVDF (Pins), PETP (Assembly)
Chemical supply piping: PFA
Drain piping: PVDF
Siemens heater
Almatec chemical drain pump
Trebor 110R Pump
Entegris 0.03um Filter
Quickchange disposable filter QCDYATMTF Housing
Levitronix BPS-3 process supply pump
Position 12: CHC1L
Chamber material: PP
Chamber chuck material: PVDF / PETP / Stainless steel
Robot arm: PVDF (Pins), PETP (Assembly)
Chemical supply piping: PFA
Drain piping: PVDF
Siemens heater
Almatec chemical drain pump
Levitronix BPS-3 process supply pump
Position 13:
Chamber chuck material: Chuck drive unit Al - anodized
Megasonic: Honda-Ultrasonic flow meter USF100A type
230 VAC, 1 P+N, 50/60 Hz
Max current: 2 A
Breaking capacity: 10,000 AIC
2005 vintage.
SEZ / LAM RESEARCH DV-38F is an advanced high-performance etcher/asher designed for the semiconductor industry. It is a fully integrated asher offering both chemical and plasma processing capabilities in the same vessel. This allows it to be operated as an etcher, an asher, or both for a wide range of applications. It is a high-end etcher/asher that has rapid cycle times with precision deposition control and uniformity of etched features. It uses ozone-based plasma and energetic ion bombardment to precisely etch target materials with extreme accuracy. It works on both complex 3D geometries and very thin films. The unique design of SEZ DV-38F features a modular, multi-role concept allowing each module to be used either alone as a stand-alone unit or to be connected to other modules in complex configurations for more specialized applications. With its powerful and versatile features, it is capable of processing a wide variety of materials, including metal oxides, silicon, compound nitrides, and polysilicon. The etcher/asher is compatible with a wide range of materials and chemicals, making it an ideal tool for processing metal oxides, compound nitrides, tungsten, and polysilicon for large-scale device manufacture. The onboard delivery system allows these materials to be further processed in the same process cycle in one single step, providing greater production throughput. The etcher/asher has up to four antechamber doors that can be opened or closed to prevent contamination during processing. Additionally, it has an extensive range of safety features to ensure that no harm is caused to personnel or to the device being processed. LAM RESEARCH DV-38F is a top-end etcher/asher that is capable of producing excellent results while maintaining a large production throughput. With its advanced precision control and efficient process cycles, it is an ideal tool for those looking for an advanced etcher/asher.
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