Used SEZ / LAM RESEARCH DV-38F #9022268 for sale
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ID: 9022268
System, parts machine
Position 1: LD, ULD Ports
Robot (Transfer unit): RBT (RS-8240)
Ionizer: Controller model 5024
Position 2: Buffer station
Robot (Transfer unit): Dual ECO Gripper left/right
Robot arm: Al anodized
Ionizer: AeroBar model 5285 (e)
Horiba HF monitor CM-210
Position 3, 4, 5, 6, 7, 8, 9: PMR1-PMR4, PML1-PML3
Robot (Transfer unit): Rear machine handling - (Twin ECO gripper)
Chamber material: PP
Chamber shape: Ring type
Chamber chuck material: PVDF / PETP / Stainless steel
Robot arm: PVDF (Pins), PETP (Assembly)
Chamber lower section: PP
Chemical supply piping: PFA
Drain piping: PVDF
Chamber cleaning: DIW
Ionizer: QuadBar 4630-DS
ABB Protronic 500 Temp controller: in-line heater controller
Position 10: PML4
Robot (Transfer unit): Rear machine handling - (Twin ECO gripper)
Chamber material: PP
Chamber shape: Ring type
Chamber chuck material: PVDF / PETP / Stainless steel
Robot arm: PVDF (Pins), PETP (Assembly)
Chamber lower section: PP
Chemical supply piping: PFA
Drain piping: PVDF
Chamber cleaning: DIW
Trebor 110R Pump
Entegris 0.03um Filter
Quickchange disposable filter QCDYATMTF Housing
Ionizer: QuadBar 4630-DS
Position 11: CHC1L
Chamber material: PP
Chamber chuck material: PVDF / PETP / Stainless steel
Robot arm: PVDF (Pins), PETP (Assembly)
Chemical supply piping: PFA
Drain piping: PVDF
Siemens heater
Almatec chemical drain pump
Trebor 110R Pump
Entegris 0.03um Filter
Quickchange disposable filter QCDYATMTF Housing
Levitronix BPS-3 process supply pump
Position 12: CHC1L
Chamber material: PP
Chamber chuck material: PVDF / PETP / Stainless steel
Robot arm: PVDF (Pins), PETP (Assembly)
Chemical supply piping: PFA
Drain piping: PVDF
Siemens heater
Almatec chemical drain pump
Levitronix BPS-3 process supply pump
Position 13:
Chamber chuck material: Chuck drive unit Al - anodized
Megasonic: Honda-Ultrasonic flow meter USF100A type
230 VAC, 1 P+N, 50/60 Hz
Max current: 2 A
Breaking capacity: 10,000 AIC
Does not include chemical supply module.
SEZ / LAM RESEARCH DV-38F is one of the most advanced plasma etch/ashers available for semiconductor processing. It is a low temperature, low-power, high-performance etcher/asher equipment that can be used for material deposition, etching, and planarization of various materials. The system is designed to be versatile and reliable, allowing for precise plasma control and deposition rate optimization. The unit is composed of a chamber, a gas box, a power supply, a controller, and a filtration machine. The chamber is designed to hold up to six wafers, allowing the tool to process multiple wafers at once. It also comes equipped with a thermally insulated cover that keeps the chamber contents at a constant temperature. The gas box supplies the gases necessary to process the wafers, including the reactive gases needed for etching and deposition. The power supply is used to generate high-frequency plasma capable of precise control of the ion bombardment energy. The controller collects data from the entire asset and adjusts the gas flows and power settings for optimal plasma etching and deposition. Lastly, the filtration model filters the exhaust gases and ensures clean operation. SEZ DV-38F provides accurate process control for etching and deposition, as well as a wide variety of customization and process optimization options. It is capable of processing both planar and three-dimensional structures, with high uniformity across multiple wafers. The equipment is well suited for a variety of materials, with low temperature requirements and low levels of power consumption. In addition, LAM RESEARCH DV-38F features a user-friendly interface with remote access and self-diagnostics, allowing for easy set-up and continual monitoring. The system also has an instant feedback unit that provides real-time data on the process itself. Therefore, DV-38F is the perfect solution for any semiconductor manufacturing or research facility looking for a reliable and cost-effective etcher/asher machine.
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