Used SEZ / LAM RESEARCH RST 101 #293652611 for sale

SEZ / LAM RESEARCH RST 101 is a high temperature etch/ash equipment designed to provide optimal etching and ashing results in a wide variety of applications. This system utilizes the latest in RF and DC technologies for optimum performance and ease of use. The unit is designed to process up to three wafers in a single chamber and includes a load station capable of handling up to three substrates at one time. SEZ RST 101 features a segmented heating zone for precise control over etch/ash parameters. The temperature can be set between 60°C and 110°C, with adjustable gas flows and pressures and adjustable reaction chamber size. This machine allows for highly selective etching and ashing, with consistently high quality results. LAM RESEARCH RST-101 also features a unique 'Multi-Process' control tool, which allows for the selection of up to seven etch/ash combinations. This asset allows users to quickly switch between different processes without having to reset parameters or start over with a new setup. Additionally, the model provides the user with access to a library of pre-programmed etch/ash profiles, which further simplifies the process. Lastly, RST-101 comes with a software package that can be used to monitor and adjust parameters and chemistry selection. For wafers that require post-etching clean-up, SEZ / LAM RESEARCH RST-101 includes a built in spin-rinse-dryer capable of operating at up to 1200 RPM. This unit also carries a range of options that allow for greater process control and flexibility. LAM RESEARCH RST 101 is ideal for any application that requires precise etching/ashing results. It is easy to use and provides outstanding results. Furthermore, the equipment employs a range of advanced features that provide precise control over the process, helping ensure that users get the exact results they are looking for.