Used SEZ / LAM RESEARCH RST 101 #293814149 for sale

SEZ / LAM RESEARCH RST 101
ID: 293814149
Wafer Size: 6"
Spin etchers, 6".
SEZ / LAM RESEARCH RST 101 is a dedicated etching/ashing equipment for semiconductor wafer processing applications. The system is designed to offer precise surface preparation, providing the highest quality etch/ash processes. With an easy to use, integrated design, SEZ RST 101 is an ideal choice for production needs. The core component of LAM RESEARCH RST-101 is its chamber design, which is unique among etch/ash systems. It features a large heating zone and air-cooled pressure lift unit, giving the unit superior temperature sensitivity and precision. Additionally, its multi-level temperature control allows for fine particles to be etched or ashed without negatively impacting the process. In addition, LAM RESEARCH RST 101 also comes equipped with a catalyst grade turbomolecular pump and a mechanical roughing pump, which provide a high pumping speed and precise process control. This enables precise variable-pressure gas etches/ashes to be executed with a range of gases suitable for many materials. The clean, hermetic machine also ensures circuit integrity during etch/ash processes, with an ultra-fine particle separation rating of 99.99999%. For fabrication needs, SEZ RST-101 provides a host of robust features. It comes with a built-in substrate RF generator for plasma etch/ash processes, an end-point detection tool for metrology, and an inert gas shield for oxidation prevention during etching/ashing. The asset also offers the highest precision in the industry, with the ability to etch/ash features at an accuracy of ±2µm. To ensure safety, RST 101 features an advanced alarm model that can be used to monitor external conditions, as well as a chemical safety equipment that monitors cabinet loading and unloading. The safety of the system is also increased with a vacuum monitor and a pressure transducer that monitor process parameters and alert the operator when necessary. To conclude, RST-101 is an ideal etch/ash unit for industrial applications. Its advanced chamber design, precise variable-pressure gas etches/ashes, robust features, and integrated safety systems make it an attractive option for production needs. With its unparalleled precision and ability to process in cleanroom conditions, SEZ / LAM RESEARCH RST-101 is an integral part of many semiconductor fabrication processes.
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