Used SEZ / LAM RESEARCH RST 101 #9099677 for sale

SEZ / LAM RESEARCH RST 101
ID: 9099677
Wafer Size: 6"
Vintage: 1995
Wet Etching, 6" Parts machine 1995 vintage.
SEZ / LAM RESEARCH RST 101 is a plasma etcher/asher that is designed to provide high-performance processing for industry-leading Plasma-Enhanced Chemical Vapor Deposition (PECVD) and dry etch applications. This device has a maximum process chamber size of 8 cubic feet and has the capability to process both small and large aspect ratio wafer substrates. Utilizing the latest in etcher/asher technology, SEZ RST 101 is capable of achieving the highest throughput rate for its size class. It has an efficient, low-volume process chamber, efficient gas-flow delivery system and adjustable process window. It is designed to flush reaction products away from the substrate during etching, allowing for increased precision and accuracy. A powerful flexibility is provided to the user with the ability to create custom recipes for small and large wafer substrates. LAM RESEARCH RST-101 etcher/asher is equipped with an integrated diagnostics package and software which is designed to provide detailed feedback about the wafer-etching process. It is configured with an advanced automation feature which automatically adjusts delivery, uniformity and other aspects based on the process conditions. The system can be customized to run a variety of etchings including isotropic and anisotropic etching, directional etching, hard-masking for selectivity and special etching for thin-film stack applications. Additionally, the etcher/asher can be used to create protective coatings or layers on the surface of wafers in order to protect the surfaces from contaminants and to improve device performance. RST-101 etcher/asher is designed to operate in a cleanroom environment with an ISO 5 class rating. It has a variety of features that ensure the highest standards of safety, such as an electronic cabinet, E-stop buttons, interlocks, and process chamber pressure-monitoring. The device also has a laser source control system which can be used to accurately control the power and duration of the laser to assure a consistent product with no variations in quality. In summary, SEZ/My SEZ RST-101 etcher/asher is a high-performance, reliable device that can be used to etch and asher small and large aspect ratio wafers with precision and accuracy. It is equipped with the latest features to ensure a high degree of safety, as well as an advanced automation feature that adjusts delivery, uniformity, and other aspects based on the process conditions. The etcher/asher also has the capability to create custom recipes, as well as to create protective coatings on the surface of wafers. It is configured to operate in a cleanroom environment with an ISO 5 class rating. With its high-performance capabilities, LAM RESEARCH/My LAM RESEARCH RST 101 etcher/asher is an ideal device for applications in the semiconductor industry.
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