Used SEZ / LAM RESEARCH RST 201 #9228278 for sale

SEZ / LAM RESEARCH RST 201 etcher / asher is an automated vacuum equipment designed to perform process steps in etching, dicing, and scribing of semiconductor wafers. SEZ RST 201 system uses a downstream plasma source to enable a wide range of materials to be processed with high reliability, uniformity and repeatability. The process chamber is built using stainless steel and has an internal volume of 8 cubic feet. The ambient unit pressure is maintained at 10-6 torr by two 300-sccm turbo-molecular (TMP) pumps, which create a pressure differential across the pump inlets. LAM RESEARCH RST 201 also includes a hybrid load-lock machine, which is able to quickly evacuate the load-lock chamber, bypassing the main pump when loading and unloading material. Additionally, the tool also includes a chemical source injector, four anisotropic etch modules, and an in-line photodiode monitor that provides real-time monitoring of wafer etch roughness. The processes achievable on RST 201 asset include oxide oxide etch and strip, silicon oxide strip, chemical-mechanical polish, deep reactive ion etch (DRIE), dicing, decap, and scribing. By utilizing an RF plasma source, the model is able to etch a variety of materials with a high degree of precision, while delivering clean and highly uniform sidewalls. The chemical source injector helps to deliver chemical precursors needed for the etching process, while the four anisotropic etch modules provide the necessary lateral overetch to produce smooth and angled profiles. SEZ / LAM RESEARCH RST 201 is compatible with a variety of wafer sizes and materials, making it an ideal tool for etching and processing semiconductor wafers. The equipment also features a user-friendly graphical user interface (GUI), which simplifies the setup and operation of the system. The unit is CE certified and delivers outstanding precision, uniformity, and repeatability, as well as low tool downtime.