Used SEZ / LAM RESEARCH SP 102 #9312906 for sale

SEZ / LAM RESEARCH SP 102
ID: 9312906
Wafer Size: up to 6"
Spin etcher, up to 6" (2) Chemical modules.
SEZ / LAM RESEARCH SP 102 is a versatile plasma etcher/asher with numerous applications across a range of industries. It is specifically designed to handle a variety of substrates and can be adapted for various processes, including etching, ashing, and sputter deposition. SEZ SP 102 has a vacuum chamber with a capacity of up to 400 liters and can be equipped with up to four process ports. The chamber is then connected to a vacuum pump, a mass flow controller, a turbomolecular pump, and a variable exhaust equipment. This provides LAM RESEARCH SP 102 with the capability to address the highest demands of modern etching and ashing processes. The control system of SP 102 allows a variety of preset recipes tailored to the specific process needs to be created. This finely tuned unit allows for precision etching/ashing with precise timing and temperature control. The process gases are fed directly into the chamber at the required mass flow rate and the result is a clean, reliable process. All of the processing parameters can be adjusted with the front panel controller, such as the RF/DC generator output power, the process pressure and the RF/DC generator frequency. SEZ / LAM RESEARCH SP 102 is equipped with a viewport for monitoring in-chamber phenomena, and all of the necessary protection systems, including a spark counter and end-point monitoring, are integrated into the machine. Furthermore, SEZ SP 102 offers a variety of features designed to maximize throughput and yield. For example, an advanced in-situ cleaning tool allows for the efficient removal of process residues, and an automatic substrate handling enables multiple batches to be processed with minimal downtime. In conclusion, LAM RESEARCH SP 102 is a powerful and flexible plasma etching/ashing asset, providing users with the ability to handle a variety of substrates with precise timing and temperature control. It has numerous features that maximise throughput and yield, making it an ideal choice for all types of etching/ashing applications.
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