Used SEZ / LAM RESEARCH SP 201 #9384204 for sale

SEZ / LAM RESEARCH SP 201 is an etcher/asher that is designed to achieve the highest possible accuracy in microscopic etching. Able to be used as a stand-alone tool or part of a larger system, SEZ SP 201 is capable of etching, ashing, thin-film deposition and more. It is a reliable and precise machine that is well-suited for a wide variety of different research and industrial tasks. LAM RESEARCH SP201 features a dual substrate processing chamber, allowing two substrates to be etched simultaneously. This dual chamber is optimized for maximum throughput with both substrate recipes being processed independently. The chamber is equipped with quartz heat shields, which protect the substrate DNA from heat generated during the etching process. The quartz shields also ensure precise temperature control. The etcher / asher has an advanced software system controlling the various parameters such as etching current, voltage, substrate temperature, partial pressure of O2 and H2, substrate thickness, and much more. This allows the user to utilize the etcher / asher for various sophisticated etching techniques as well as the deposition of various metallic and dielectric thin films. SP201 has a resolution of 0.5 μm and a repeatability of 0.5 μm. This ensures extremely precise etching and ashing, making SEZ SP201 ideal for applications that require the highest level of accuracy. SP 201 is equipped with two distinct etching methods, which can be used to process a variety of substrate materials. Dry etching is used to etch oxide, nitride, organics and most metals, while wet etching is used to remove thicker films of polycrystalline metals. LAM RESEARCH SP 201 also has an anti-stiction device, which helps reduce anti-stiction defects during the etching process. SEZ / LAM RESEARCH SP201 is an etcher / asher that is equipped with high precision and high repeatability features. It is ideally suited for performing various types of etching and thin film deposition tasks with the highest possible accuracy. The etcher / asher can quickly process multiple substrates simultaneously, making it an effective and efficient tool for materials research and industrial applications.