Used SEZ / LAM RESEARCH SP 203 #9206214 for sale

SEZ / LAM RESEARCH SP 203 is a high-performance etch/ash equipment with an adjustable gas formulation specifically designed for increasing throughput in various reactive ion etching and ashing process applications. The system features a unique process chamber design which provides an exceptionally large gas volume to ensure consistent gas delivery and uniform plasma density. SEZ SP 203 can also process substrates of up to 25 inches in size and has a maximum of 10 gas channels for multiple etching processes. The unit also includes an advanced diagnostics capability which allows users to monitor selected plasma parameters and make real-time adjustments to the chamber environment for accurate process control. It also has an advanced active ion containment feature which improves the process repeatability and eliminates the need for manual shielding. The process control options on the machine are robust and include the ability to independently modulate the ion source, substrate bias, and chamber temperature. With this capability, users can finely adjust the process to optimize the results for their particular materials and process conditions. The tool also provides both manual and automated control to help simplify asset operations. LAM RESEARCH SP 203 is a comprehensive etch/ash model with the capability to process a wide range of materials. Its advanced diagnostics, adjustable gas formulation, and finely adjustable process parameters make it an ideal choice for a variety of applications including dielectric and metal etching, ashing, thinning, and thin film deposition. It is an effective solution for increasing throughput in the manufacture of various semiconductor components, such as memory chips, microcontrollers, display drivers, and other semiconductor devices.