Used SEZ / LAM RESEARCH SP 203 #9228170 for sale

SEZ / LAM RESEARCH SP 203
ID: 9228170
Vintage: 2001
Spin etcher With chamber 2001 vintage.
SEZ / LAM RESEARCH SP 203 is an advanced RIE (Reactive-Ion Etching) Etching Equipment designed for production and development of complex surface micromachined structures. This versatile etching system is capable of etching almost any surface including those of hard and soft materials. It features an advanced and highly efficient Advanced Plasma Source (APS) with a powerful mixture of gases and two independent atom sources which render it capable of both isotropic and anisotropic etching. Additionally, SEZ SP 203 is equipped with a powerful Electron Cyclotron Resonance (ECR) source, providing exceptional uniformity and selectivity in the etching process. LAM RESEARCH SP 203 is ideal for high-precision etching of a variety of materials including but not limited to semiconducting materials such as Silicon, Gallium Arsenide, SiC, GaN, and InGaAs, and dielectrics such as silicon dioxide, silicon nitride, polyimide, poly-silicon, and glass. This advanced etching unit can also be used to etch metals such as Aluminum, Titanium, and other materials used in the production of MEMS (micro-electromechanical systems) devices. The machine is equipped with a state-of-the-art Ash Containment Filter Tool (ACFS) for etching waste containment and filtration. This highly efficient ACFS offers improved etching operations with less environmental footprint, reduced costs, and improved process control. SP 203 is also capable of process control via advanced process controllers and monitoring asset. This advanced monitoring model can be used to monitor and analyze the performance of the etching equipment. SEZ / LAM RESEARCH SP 203 is also equipped with a user-friendly LCD touchscreen user interface for simplified operation and adjustment of the etching parameters. Additionally, this advanced etching system is compatible with ESISEZ Software, allowing users to monitor and control all aspects of the etching process and analyze the results of the process. With its advanced plasma source, robust ACFS waste filtration unit, highly efficient process monitoring machine, and user-friendly interface, SEZ SP 203 is a powerful etching tool ideal for production and development of microfabricated structures.
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