Used SEZ / LAM RESEARCH SP 203 #9276814 for sale

SEZ / LAM RESEARCH SP 203 is an etcher/asher used for the precision removal of material from the surface of a range of substrates including hard metals, alloys, and covered silicon wafers. Specifically, the equipment is equipped with an ICP (Inductively Coupled Plasma) Source, which uses a high frequency discharge to create an etch or ashing process. The results are consistent, precise, and easily reproducible over multiple runs. The powerful ICP Source produces etching rates up to 8,000 angstroms/minute with an excellent surface profile. Additionally, the system is capable of accumulating up to 10 minutes of etching time and can also reach temperatures of up to 1000 degrees Celsius. The unit is capable of automatically controlling the etching process with a simple user interface. It is equipped with a process controller module, which features a graphical user interface to facilitate easy programming of etch time and temperature settings. By analyzing the results of each etching process, the machine can quickly determine and control the optimal process parameters for specific materials. The tool is designed with multiple safety features, including a physical barrier between the plasma and the operator, as well as a built-in shield guard and an exhaust plume enclosure. With a durable stainless steel construction and an inert atmosphere, the asset is ideal for use in any laboratory environment. SEZ SP 203 is ideal for highly precise etching and ashing applications. With its robust and user-friendly design, the model is invaluable in helping laboratories make efficient and accurate etching and ashing processes. It is a reliable and powerful etcher/asher for any laboratory environment.