Used SEZ / LAM RESEARCH SP 304 #293818314 for sale

SEZ / LAM RESEARCH SP 304 is a plasma etcher/asher designed for use in semiconductor manufacturing. It has the capability to etch, ash, and amorphize semiconductor materials with superior throughput and accuracy. This equipment is well-suited for etching and amorphizing photoresist masks for chip prototyping, as well as for regrinding surfaces for LED, TFT, and LCD fabrication. SEZ SP 304 is equipped with an advanced scalar control system that provides excellent uniformity and process repeatability over a wide range of substrate configurations. This unit allows users to precisely adjust various processing parameters and working times, which can be modified on the fly or loaded from programs created within the machine. LAM RESEARCH SP 304 also utilizes a high-powered RF generator, allowing for high-throughput etching and ashing on a variety of substrates. SP 304 features a unique combination of enhanced etching and ashing capabilities, allowing substrates to be etched and ashed rapidly and with great accuracy. This is accomplished through the etchesource and ashersource, two separate sources of plasma that can be used in combination or consecutively for high-precision etching and ashing. By having both a DC bias source and a microwaving source, users can run etching and ashing processes simultaneously, enabling shorter run times. SEZ / LAM RESEARCH SP 304 also utilizes a twin chamber design which offers easier substrate loading and improved access to the upper deck. The upper chamber features multiple objectives and is equipped with a quartz plate heater for precise temperature control. This ensures a consistent substrate temperature for improved process repeatability. SEZ SP 304 is a powerful etcher/asher that provides outstanding throughput and accuracy for a variety of semiconductor materials. With its advanced scalar control tool, twin chamber design, and enhanced etching and ashing characteristics, it offers a reliable, repeatable platform for producing etched/ashed substrates with high accuracy and consistent throughput.