Used SEZ / LAM RESEARCH SP 323 #293757562 for sale

SEZ / LAM RESEARCH SP 323
ID: 293757562
Wafer Size: 12"
Spin processor, 12".
SEZ / LAM RESEARCH SP 323 is a specialized etching and ashing equipment that provides users with a flexible and cost-effective tool for their processing needs. It is designed for high quality, repeatable etching and ashing of different materials, including metals, semiconductors, dielectrics, and glass. SEZ SP 323 system is a reliable etching/ashing unit that is easy to operate and maintain. LAM RESEARCH SP323 is equipped with a high frequency plasma generator; this powerful generator is used to etch thin layers and structures on to a selected substrate. The generator produces necessary etch parameters, pressure, and temperature which along with the choice of plasma gases, allow users to accurately perform etching and ashing on different materials. LAM RESEARCH SP 323 comes with a heating element designed to support the substrate material's thermal stability during the etching process. The machine has an auto-slice feature that allows users to perform multiple etching procedures by automatically setting the etch parameters for each layer. This feature makes the etching process simple and efficient. SP323 is equipped with a sophisticated vacuum tool that consists of several multistage pumps, vacuum gauges, and valves, which ensures a one-step and safely controlled vacuum process. The automated recipes-controlled process enables the user to set up a series of recipes to optimize process results and reduce operation time leading to cost saving. The user can also accurately monitor and control the etching process using SEZ SP323's touch-screen HMI. This touch-screen display displays all the process information including pressure, temperature and gas flow setting. It also features a user-friendly interface that allows users to easily monitor, set up, and control the etching process. SEZ / LAM RESEARCH SP323 is an all-in-one etching/ashing asset that provides users with the necessary parameters, process flexibility, and accuracy to create complex structures and etch difficult materials. This model is capable of supporting a wide range of materials and is ideal for creating intricate, high quality parts.
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