Used SHIBAURA µASH 8100 #9234516 for sale

SHIBAURA µASH 8100 is an etching and ashing equipment that uses infrared radiation and radiation excitation techniques to provide simultaneous etching and ashing of various materials. The system has emissions susceptible from the infrared through to about 200nm, which can be used to etch and asher a wide range of both inorganic and organic materials. The unit typically requires an alignment time of under 5 minutes in order to establish the precise focus of the radiation used for etching and ashing, providing a very efficient process. ΜASH 8100 has a very fast etching rate which can reach up to 35000 nm/min over a larger area of 5x5 cm, allowing for a faster and more accurate etching and ashing time. Additionally, the machine is capable of the application of additional gas to the target area, allowing for a more accurate and precise etching control over the material being treated. The control of SHIBAURA µASH 8100 is provided via a PC which is connected to the control cabinet. This allows the user to set the desired working parameters, such as the etching and ashing time, temperature, and chamber pressure. The tool also has a remote access feature which allows a technician to monitor the asset performance remotely, allowing for a great level of diagnostic capability. ΜASH 8100 is built with a safety model known as the Surround Signal Equipment, which ensures the user's protection from radiation and other hazardous gases. Furthermore, the system includes a multi-stage pre-filter unit that ensures the purity of the work chamber, and a LED display that provides a clear view of the current working parameters. The machine includes a manual that provides comprehensive instructions on its setup, operation, and maintenance, which is simple and straightforward. In addition, the manual also provides detailed diagrams, diagrams of the parts, and servicing information. SHIBAURA µASH 8100 is an ideal tool for users looking to quickly etch or ashe materials for research, development, and production purposes. Its fast etch rate, remote monitoring and control features allow users an efficient and effective way to quickly modify materials for many applications.