Used SHIBAURA CCS-2110 #293815162 for sale

SHIBAURA CCS-2110 is a high-performance plasma etcher/asher equipment designed for precise and efficient material removal and surface modification processes in semiconductor, MEMS (Microelectromechanical Systems), and nanotechnology applications. This advanced system combines innovative technology, reliable performance, and user-friendly operation to meet the demanding requirements of the semiconductor industry. CCS-2110 features a dual-mode etch/ash process capability, allowing users to switch between etching and ashing modes with ease. This versatility makes it an ideal tool for a wide range of applications, including photoresist removal, surface cleaning, dielectric etching, and pattern transfer. One of the key highlights of SHIBAURA CCS-2110 is its advanced plasma generation and control unit. The machine is equipped with a high-power radiofrequency (RF) generator that delivers precise control over plasma parameters such as density, uniformity, and selectivity. This ensures consistent etching and ashing results across the entire process chamber, leading to high process repeatability and yield. CCS-2110 also features a high-precision gas delivery tool that allows users to accurately control the flow rates and mixtures of process gases. This level of control is essential for achieving desired etch rates, selectivity, and surface morphology in various material systems. Additionally, SHIBAURA CCS-2110 is equipped with a state-of-the-art chamber design that ensures efficient plasma generation and uniform gas distribution. The chamber features a high-quality reactive ion etching (RIE) electrode configuration that enables directional plasma etching, resulting in high aspect ratio features with minimal sidewall damage. The asset also includes advanced temperature control mechanisms to maintain process stability and reproducibility. The temperature control model allows users to precisely regulate the substrate temperature during processing, which is critical for controlling etch selectivity and profile evolution. In terms of safety and ease of use, CCS-2110 is equipped with multiple safety interlocks, plasma emission monitoring systems, and automated process control features. These safety measures ensure operator protection and promote a safe working environment in the cleanroom. Furthermore, the equipment is designed with user-friendly software interfaces and intuitive control systems that allow for easy recipe programming, parameter adjustment, and real-time process monitoring. This enables users to quickly set up processes, optimize etch/ash conditions, and troubleshoot any issues that may arise during operation. Overall, SHIBAURA CCS-2110 is a versatile and reliable plasma etcher/asher system that offers advanced process control, high productivity, and excellent performance for a wide range of semiconductor fabrication and research applications. Its innovative features, robust design, and user-friendly operation make it a valuable tool for achieving precise and reproducible etching and ashing results in the semiconductor industry.