Used SHIBAURA CDE 80 #9085091 for sale

SHIBAURA CDE 80 is a high performance etcher/asher, utilized for a variety of substrate removal applications. This device is capable of removing native or oxide layers, depositing thin films, and patterning substrates with high precision. The machine is equipped with a qualified components such as an EDP 3 etch controller, a RIE etch chamber, a quartz tube RF generator, a support platen, and a window plate. The sophisticated controller unit enables complex etching operations for etching both isolated and clustered features. The EPD 3-controlled RIE chamber has been designed to produce highs densities of plasma with excellent uniformity for consistent processing of mid-area substrates. Additionally, the RF generator is capable of creating temperatures up to 1,400°C, enabling oxide and nitride etching. An independent window plate is provided for use with the quartz tube, allowing observation of the etching process during operation. SHIBAURA CDE-80 can be customized with several options or consumables, such as a full range of gas supplies and a selection of sources. Internal and external chillers can be specified for cooling the system or the substrate during etch operations. Furthermore, an external ECR input can be provided to further enhance etching operations. CDE 80 can carry out an impressive range of advanced substrate etching routines, making it an excellent choice for prototyping, component production and research. The equipment is reliable, precise and effective, offering users a high level of control and accuracy over the entire process. This advanced etching system is perfect for producing substrates that require tightly controlled etch features or for users seeking high production yields.