Used SHIBAURA CDE 80N #293796125 for sale

SHIBAURA CDE 80N is a high performance etcher that offers an impressive etching speed of up to 20,000 cycles per hour. It consists of a set of electrodes, laser, high power laser diode and RF generator. The etcher is designed to etch various materials, such as Si, SiO2, SiN, Ti, Ta, Ni, NiCr, Pt, and others, and can do this with a high precision of up to 1.0 µm line width. It is capable of producing deep etched results with high aspect ratio. CDE 80N uses a special electrode system, which allows for fast and accurate etching and a high rate of etch rate. The etcher features advanced controls that allow for precise etching. A wide range of etching conditions can be set to produce different types of patterning. The etcher is equipped with a high power laser diode that provides precise etching at low ablation rates. The high power laser diode also ensures uniform etching of the surface of the material, regardless of its thickness. The etcher also has a RF generator, which can be used to create low noise signals for controlling the ablation rate and the etching depth. SHIBAURA CDE 80N is designed to be user friendly and easy to operate. The operators can adjust the ablation rate and etching parameters to achieve desired results. It also has an intuitive and user-friendly interface for controlling the etching parameters. CDE 80N is designed to be reliable and durable, and can provide consistent results day after day. It is also designed to be energy efficient and boasts low noise and low pollution levels. It is also designed with noise reduction features, which make it a great choice for those looking for a quiet environment while etching. Overall, SHIBAURA CDE 80N is a great etcher that offers a high rate of etching, precision, and a reliable and user friendly design. It can etch a wide variety of materials with high precision and is great for making intricate patterns and circuit boards. It is also a great choice for anyone looking for an energy efficient and low noise etcher.