Used SHIBAURA ICE 300 #9405111 for sale

SHIBAURA ICE 300 is a dry-etch, chemically assisted plasma system used for high-precision micro-patterning. This equipment is well suited for use in academia, microelectronics and bio-fabrication. It is a versatile, reliable, and user-friendly etcher/asher suitable for a wide range of materials like semiconductors, glasses and ceramics. ICE 300 is built with a 13.56MHz power generator, providing a precise and efficient etch of materials down to the nanoscale. The generator also offers a highly stable pressure control so precise etching depths can be achieved. The generator is connected to a pressure chamber, a source of argon, oxygen, and/or nitrogen and a microwave deposition system, giving the tool precise manipulation of etch depth, mask level, etch angle, and etch width. SHIBAURA ICE 300 has an electron beam gun that is used to define edges and mask boundaries. It has an Optically Gradient Sample Motion System that can quickly and accurately set desired etch angle. It also has a full loop RF power control which enables the user to quickly achieve their desired etch and repeat their results with high accuracy and repeatability. For safety, ICE 300 has a reflective window that prevents high-energy particles from hitting personnel during the etching and ashing process. It is a closed-loop process that has a lot of redundancies in place to prevent any major accidents. SHIBAURA ICE 300 is a versatile tool that is able to etch a variety of materials such as alumina and silicon wafers, SiO2/SiN, polymers and organic materials. It also provides excellent opportunities for fabricating micro-patterns, including features down to 50µm. It is also a user-friendly etcher, which is why it is suitable for microelectronics and bio-fabrication applications. In conclusion, ICE 300 is an excellent etcher and asher for microelectronics, bio-fabrication, and other lab applications. It offers precise patterning and superior repeatability and is a reliable and user-friendly tool for various applications.