Used SHIBAURA ICE 300S2 #9405824 for sale

SHIBAURA ICE 300S2 is a state-of-the-art etcher/ascher machine designed to perform a wide variety of etching operations on a variety of substrates. It incorporates a multi-zone approach to etching, allowing the user to select the exact etch recipe and substrate type, ensuring consistency and quality across process runs. The advanced design of ICE 300S2 features automated temperature control and an advanced cassette equipment for high throughput and repeatability. The advanced controls and design ensure the highest performance and accuracy for each process run. SHIBAURA ICE 300S2 is a robust, precision-engineered machine that offers advanced features and benefits for improved quality, efficiency, and cost-effectiveness. It is built with an advanced thermal-compensated chamber design, featuring a three-zone temperature control system for precise etching control. It is also equipped with a novel cassette unit, allowing for fast and efficient switching between substrates and etch recipes. The machine also boasts a high etch rate, allowing for rapid cycle times and high yields. The ease-of-use of ICE 300S2 ensures operational reliability and positive user experience. Featuring a fully enclosed housing and user-friendly interface, users can set up and run the etch recipes quickly and easily. It also features built-in safety mechanisms and alarms to prevent inadvertent etch damage. Additionally, the etch recipe management machine ensures all user settings are meticulously stored and optimized for each etching job. SHIBAURA ICE 300S2 also offers a wide range of applications. With the device, users can etch a variety of substrates including wafers, chips, and integrated circuits. Its advanced etch recipe enables close-to-maquillage features and high-resolution patterns. It is also HAZMAT certified, allowing for multi-layer resist and selective etch applications. ICE 300S2 is a dependable, reliable, and precise etch solution. It is designed to offer maximum precision and outstanding performance in etch processes. With advanced features and state-of-the-art technology, it guarantees superior etch results in the most demanding applications.