Used SHIBAURA U-ASH8100 #9226215 for sale

Manufacturer
SHIBAURA
Model
U-ASH8100
ID: 9226215
Wafer Size: 6"
Vintage: 1996
Asher, 6" 1996 vintage.
SHIBAURA U-ASH8100 is a high-performance dry etching and ashing equipment with excellent process flexibility and uniformity. This system utilizes ion beams and electron impact to efficiently etch and ashing a variety of materials, including silicon, low-k, and advanced photoresists. The etcher is equipped with a reliable, easy to use, and intuitive user-interface that makes the processing simple and efficient. It can be configured with up to three processing chambers and can be operated either in single-chamber or dual-chamber unit operation. The etcher also features an advanced chamber cleaning sequence, which effectively eliminates particle and film residue from the processing chamber, significantly improving process reliability. SHIBAURA U ASH8100 utilizes a radio frequency voltage of up to 2000V to effectively etch and ashing thin films. This allows for deep, uniform etches and ashing of thin film material in a wide range of processing temperatures. This versatile machine can be operated with either a single or dual gas injector, allowing for a wide range of processes, including reactive ions etching (RIE), ion beam etching (IBE) and ion beam assisted thermal desorption (IBT). UASH 8100 also includes a vacuum flange for easy integration with other vacuum systems. This allows the user to create modular systems which can then be automated. The etcher and ashing stations can also be controlled and monitored remotely, either through RS485 or ethernet based communications. U-ASH8100 is designed to operate in between 30 mTorr and 2 Tor as well as temperatures of up to 1000 degree Celsius. The tool is also equipped with an advanced multi-frequency tuning module, which allows the user to adjust the etching/ashing frequency as required for specific applications. This also improves process repeatability and uniformity, ensuring consistent results. SHIBAURA UASH 8100 is an excellent choice for etching and ashing thin films, providing reliable and uniform results. It's intuitive interface makes it easy to operate, and its process repeatability and flexibility make it an ideal asset for industrial and research applications. U ASH8100 is an ideal model for users who require a reliable and efficient etching/ashing solution.
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