Used SI ENGINEERING Asher 200 #9205486 for sale

SI ENGINEERING Asher 200
ID: 9205486
Wafer Size: 2"
Wet etcher, 2".
SI ENGINEERING Asher 200 is an etching machine, manufactured by SI ENGINEERING and designed for the precision etching of semiconductor materials. It is capable of etching circuits on thin wafers and substrates with great accuracy and speed. This is achieved by using an inert gas etching process, which involves introducing a plasma of Argon, Oxygen or Nitrogen gas to flus out unwanted material in a controlled environment. Asher 200 offers a wide range of process capabilities. It has a universal power supply, allowing users to select the desired parameters for their application. These parameters can be easily adjusted by means of both manual and programmable controllers. SI ENGINEERING Asher 200 offers a high resolution, making the etching process precise and accurate. Asher 200 has a big chamber, designed for etching larger substrates. The chamber size of SI ENGINEERING Asher 200 is 39x39x45 centimeters. Due to its large size, Asher 200 can theoretically undertake more complex etching projects. The chamber is constructed from stainless steel, making it corrosion resistant and ideal for semiconductor material etching. SI ENGINEERING Asher 200 is equipped with a high-resolution image resolution scanning unit, mounted on a precision-controlled platform for accurate scan and adjustment. This scanning system is designed to eliminate the need for manual movement of the etching target. The scanning unit also incorporates Auto-Focus and Auto-Repeat functions to allow parameters to be set and changed during the etching process quickly and easily. In addition to the scanning unit, Asher 200 has a safety system which is designed to detect the presence of gas entering the chamber. If the gas is detected, an alarm is triggered and the system will shut off energy supply to the chambers. SI ENGINEERING Asher 200 is a reliable etching machine. Its quality is second to none, as evidenced by its ISO 9001 certification. It is designed to perform etchings safely and with high-Precision for Semiconductor material.
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