Used SPI Plasma Prep II #293617060 for sale

SPI Plasma Prep II is an etcher/asher designed for precision etching or ashing of samples in a number of applications including semiconductor device fabrication, pharmaceutical manufacturing, field analysis, and research and development. The versatility of this device ensures that it can fulfill the needs of a variety of etching/ashinig applications. The equipment is comprised of a high power RF generator, a plasma chamber, a liquid cooling system, vacuum pump and an automated process controller. The device is engineered to provide maximum repeatability and accuracy with each etching or ashing process. The unit is designed with safety protocols and features such as isolated RF connections and a safety door interlock that prevents accidental exposure to dangerously high RF levels. The high power RF generator supplies the energy that drives the etching and ashing process. The plasma generator has the ability to modulate the power output from 0-500 Watts. The frequency of the plasma generator can also be easily adjusted to meet the needs of a specific etching/ashing direction. The etched/ashed sample is placed inside the plasma chamber. This chamber is designed to maintain a stable pressure environment for the sample and to contain the generated plasma. The chamber features a large viewing port which allows the user to observe the etching/ashing process visually. The chamber is surrounded by a liquid cooling machine which removes waste heat and maintains the safe functioning temperature of the tool. The vacuum pump of the asset is responsible for removing unwanted particles, as well as dissipating the hydrogen and oxygen generated by the plasma process. This feature allows the model to operate cleanly and efficiently and maximizes etching/ashing accuracy. The automated process controller allows the user to easily program the desired etching/ashing parameters of the process. It is designed to communicate with the chamber and plasma generator to provide accurate feedback of the process in order to ensure maximum repeatability. Plasma Prep II is a reliable and robust equipment that is designed for precision etching and ashing of samples in a variety of applications. It features advanced safety protocols, high power RF capabilities, a stable pressure environment, advanced cooling system, efficient vacuum pump and an automated process controller. The unit is highly reliable and the perfect choice for a wide range of etching and ashing processes.