Used SPP MUC 21-098 #9239652 for sale

SPP MUC 21-098 is a specialized piece of equipment used primarily within the semiconductor industry for etching and/or ashing. It has a three-dimensional chamber construction, with a large handling volume with the ability to treat samples up to 6" in diameter—greatly enhancing the throughput capability. The etcher/asher offers a host of automation options, such as computer controlled processing and open architecture for robotics and data management. It is equipped with a three-source, two-stage RF generator with a frequency range from 13.56 MHz to 50 MHz, and the ability to carry out an optimized process to produce repeatable results. The plasma source is designed to handle both ICP and capacitively coupled modes of operation. The gases are heated by a quartz tube inductively coupled plasma (ICP) feature, with an independent control over the power to the central rod and the confinement rings, allowing for optimized process monitoring. The ashing process relies on an RF-based etch source, as well as a magneto-driven gas distributing system for a uniform substrate etch throughout the chamber. An automated shutter option further ensures precision and repeatability, with the ability to switch between four different directions when required. MUC 21-098 also incorporates a multi-mode supersonic source in order to achieve higher etch rates and feature accurate profile control. The supersonic nozzle operates in three modes, tailored to the requirements of the process, allowing for clean, smooth walls and round feature walls. SPP MUC 21-098 additionally supports optional sample excaption, with a precision stage movement device that can support sample heights of up to 25 mm. The sample helps to ensure uniform etch and uniform interconnect lines. Finally, MUC 21-098 has a built-in safety system, consisting of a pressure interlocking door and a proximity sensor. This ensures that the etcher/asher is always operated safely and securely.