Used SPTS LPX APS Pro #9294793 for sale
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ID: 9294793
Wafer Size: 8"
Vintage: 2014
Etcher, 8"
Single chamber (Aluminium)
Load-locked
Capable, 8"
Process chamber: APS PM
APS PM Chamber:
SiC / GaN
Oxide
Nitride
Deep oxide
Glasses
Sapphire
PZT / Pt
LPX Single Wafer Load Lock
Multiplex ICP process chamber:
Magnetic and heated chamber
LEYBOLD Turbo pump
Heated VAT pendulum valve
Backside helium cooling
Extracted gas box with orbitally welded gas lines
Electronics Rack
LCD flat panel monitor
MKS Capacitance manometer (0.1 Torr)
MKS Spectrum RF generator (Source)
MKS Spectrum RF generator (Bias)
VERITY optical endpoint detector
EDWARDS iH80 vacuum pump (or equivalent)
ALCATEL ACP28 vacuum pump (or equivalent)
SMC Thermo chiller
System cables
Gas box: N2, SF6, He, Ar, O2
Operations manuals
Electrical drawings
Documentation (Complete manual set)
System power: 400 V, 80 A, 50 Hz, 3 PH+N
2014 vintage.
SPTS LPX APS Pro is an advanced wafer processing etching and ashing equipment specifically designed for both research and industrial applications. The system consists of an advanced SmartProcess™ platform with the latest technologies in both front-end loading and unloading and in-situ process control and monitoring. The unit is designed to be highly reliable, fast, and efficient, providing outstanding user-friendliness, scalability, and flexibility. Its main features include: High etching and ashing efficiency - The machine is equipped with an advanced plasma generator and advanced gas mixing systems that provide superior precision and control over the etching and ashing processes. This allows users to obtain better throughput with fewer iterations and shorter process times. SmartProcess™ platform - The tool is equipped with an advanced process automation platform that allows users to customize their process parameters and settings. This enables users to optimize the asset for their specific needs and maximize efficiency and performance. In-situ process control and monitoring - The model is equipped with a powerful process monitoring equipment that provides real-time monitoring and control over the etching and ashing processes. This allows users to identify any potential problems quickly and adjust their process settings accordingly. Versatility - The system is highly versatile and can be used with different types of wafers, such as silicon, silicon-on-insulator (SOI), epitaxial, and gallium arsenide (GaAs). Additionally, the unit can be used for a wide range of applications such as lithography, deep reactive ion etching (DRIE), and ion milling. Easy-to-use - The machine has an intuitive user-friendly interface that allows users to quickly and easily set up their processes. Additionally, the tool also includes comprehensive documentation and training materials that enable users to master the asset quickly and easily. High-precision engineering - The model is designed with high-precision engineering for superior accuracy and control. Additionally, it is also designed for extended service life and minimal maintenance costs. Scalability - The equipment is designed with modular components that can be easily configured to create larger and more complex etching and ashing systems. Overall, LPX APS Pro is an advanced etching and ashing system that combines cutting-edge technologies with high precision engineering for optimum efficiency, performance, and accuracy. It is suitable for both research and industrial applications and is designed to be highly reliable, fast, and easy-to-use.
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