Used STS / CPX 320PC #9145327 for sale

STS / CPX 320PC
Manufacturer
STS / CPX
Model
320PC
ID: 9145327
Wafer Size: 8"
Vintage: 1995
Reactive ion etcher, 8" 1995 vintage.
STS / CPX 320PC Asher is a heated pressure chamber device designed for durable etching and substrates hardening. It features a 8" x 12" etching chamber and is capable of accommodating flat substrates up to 6" thick and 4" x 8" substrates. It utilizes a titanium carbide-based anvil with tungsten-carbide-based pressplates for a consistent etch during operation. The manometer-assisted pressure chamber utilizes a steady vacuum pressure and piezo 2-stage electronic pressure control built-in for more accurate results. This chamber is sealed with a positive-contact seal and is equipped with adjustable-distance mainframes to provide a stable etching platform for the desired substrate. The Asher also offers a built-in timer and advanced control panel for easy operation. STS 320PC heated pressure chamber is designed with an air-to-water heat exchanger, forced air circulation, and an advanced cooling system for efficient etching operations. Titanium and aluminum substrates can be etched with the device. It can also be used to etch birch wood and similar substrates. The Asher is also capable of etching multiple substrates at the same time and can be adapted to different tools for multiple functions. The Asher features an edge-locking design for increased control and safety, along with the adjustable-distance mainframes and an L2 remote control that allows you to increase or decrease pressure on the substrate to achieve your desired etch depth. It also has a two-stage temperature management system for precise pressure control, enabling you to achieve intricate details. Additionally, the device is protected from oxidization and abrasion with an easy-to-clean, non-stick interior finish. Overall, CPX 320 PC Asher is a user-friendly, efficient etching device designed for optimal heat distribution and etched-substrate quality. It is perfect for craftsmen and designers who want accurate etching results without sacrificing time or precision. The adjustable mainframes and the air-to-water heat exchanger provide perfect etching results with a minimum of effort.
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