Used STS / CPX Multiplex ASE #293748419 for sale

STS / CPX Multiplex ASE is an etcher or asher that utilizes advanced plasma etching and ashing technology to etch and asher substrates with high accuracy and precision. This plasma etching and ashing system can etch a variety of substrates including silicon, glass, and metals. STS Multiplex ASE features a multi-level segmented reactor design, providing high-density plasma etching and ashing for a variety of wafer sizes at a repeatable throughput of up to nine wafers per hour. CPX Multiplex ASE can utilize two processes simultaneously, allowing users to etch two substrates at the same time with the use of two expandable trays. The tray can expand from 8"x8" to 8"x11" to accommodate a range of wafer sizes. Multiplex ASE provides flexible matching of both the reactant gases and radio frequency (RF) power to optimize process parameters for specific applications. Its flexible matching of process parameters provides highly repeatable results and process reliability perfected over years of development and testing. STS / CPX Multiplex ASE has built-in redundancies to account for any gas or RF failsafe scenario when performing processes. STS Multiplex ASE is capable of performing etching applications such as sacrificial etching, deep reactive ion etching, plasma-enhanced chemical vapor deposition (PECVD), and plasma-based microwave and power densification processes. CPX Multiplex ASE has a customizable substrate support system that enables easy and repeatable processing of wafers and substrates. It is also rated for up to one million wafers or substrates processed before any type of maintenance is necessary. Multiplex ASE also features a user-friendly interface for controlling applications and recipes, making it easy to use and responsive when changes are needed. STS / CPX Multiplex ASE is a user-friendly and accurate etcher and asher that can provide flexible matching of process components and precise results. Utilizing advanced plasma etching and ashing technology, this system is well-suited for many substrates including silicon, metals, and glass. With built-in redundancies to account for any gas or RF failsafe scenarios and the ability to process up to one million wafers before any maintenance is required, STS Multiplex ASE can easily integrate into any process line and provide repeatable and precise results.