Used STS / CPX Multiplex ICP #9185200 for sale

STS / CPX Multiplex ICP is an advanced etcher/asher equipment that uses multiple individual processes to achieve high-precision microfabrication of metal parts. The system is composed of an inductively-coupled plasma source (ICP) and a multiplexed RF generator, which is capable of firing multiple ICP sources in sequence. The ICP source is configured so that the RF generator fires in four synchronised cycles, providing a continuous high-power plasma stream over a wide area in the chamber. The ICP source has a broad frequency range, allowing for intricate pattern control and more precise surface etch rates. The ICP source is also capable of etching deeper metals and coated surfaces with minimal distortion and high-yield. The multiplexed RF generator contains multiple channels, each capable of delivering high-power pulses to the ICP source. This provides a flexible etching environment as well as extremely uniform etch rates. The multiplexed RF generator also allows for precise timing between the ICP sources, allowing them to fire in sync and maximizing process throughput. STS Multiplex ICP etch/ash unit has been shown to provide high-quality film deposition and etching of various metal substrates, including copper, aluminum, nickel, and steel. The machine is also capable of etching complex patterns and high-precision surfaces. In addition, the tool can also be used to fabricate 3D-printed components using metal powder particles or fragmented films. CPX Multiplex ICP is a versatile and reliable etcher/asher asset capable of providing high-quality, consistent, and well-controlled results for a variety of processes. It is a reliable solution for both microfabrication and 3D printing applications, and can be used for high-precision etching of metals and other materials.