Used STS / CPX Multiplex ICP #9303047 for sale

STS / CPX Multiplex ICP is a sophisticated etcher and asher equipment employed for the critical control of plasma process applications. This system is best suited for deep etching, high aspect ratio sample and dielectric stacks and nanolithography tasks. STS Multiplex ICP has proved to be the best solution for hydrophobic bond coat resist etching, backside oxide removal, carbon mask etching, and selective SiO2 etching. Its feature rich capabilities also make it a great choice for plasma etching and ashing of solder mask, FEOL dielectric materials, nanofabrication, multi-level MEMS and BioMEMS packaging applications. In terms of physical characteristics, CPX Multiplex ICP is a high-speed, area-wide unit equipped with advanced process monitoring and control tools. It is designed for optimal energy frequency control, a multi-power generator, multi-stage extraction power control, and an embedded PC controller. Its advanced process control machine enables fast and efficient etching production of complex and homogenous microstructures. In terms of performance, Multiplex ICP is capable of providing optimum etching outcomes for various process parameters such as chamber atmosphere, ionization, deposition, and etch rates. It features a unique multi-power generator with independent chamber control in order to ensure precise control of both etching and deposition processes. It also has a multi-stage extraction power control tool for complete optimization of the etching process. In terms of safety considerations, STS / CPX Multiplex ICP is equipped with a safety shield. This shield offers maximum protection against accidental contact with UV radiation and chemical and mechanical hazards, as well as highly charged and hazardous plasma. In addition, the asset is also equipped with a variety of control systems, such as a plasma tolerance alarm, a clean room contamination alarm, and an RF generator overcurrent alarm. Finally, STS Multiplex ICP is capable of delivering performance, quality, and reliability in etching and ashing applications at an affordable price point. It is a multi-purpose solution for industries and laboratories looking to execute tasks that require precision and accuracy. With its capacity for efficient use and protection, CPX Multiplex ICP is an excellent choice for etchers and ashers seeking to optimize their production processes quickly and cost-effectively.