Used STS / CPX Multiplex ICP #9316178 for sale

STS / CPX Multiplex ICP (Inductively Coupled Plasma) Etch/Asher is a highly engineered equipment designed for mass production of microelectronic components. The system is capable of processing up to 10 wafers per run, with a throughput time of 300 seconds (5 minutes) per run. The unit utilizes the well known and highly respected ICP technology which provides a simple, fast, and low-cost etching of various metals and dielectrics. STS Multiplex ICP is a cost effective tool providing a highly uniform etch over the entire wafer as opposed to traditional solutions which require additional processing to maintain the same level of accuracy. Traditional aqueous etching solutions often require a large-scale etching setup which can be both expensive and time consuming, whereas CPX Multiplex ICP machine provides great accuracy for the same cost and time requirements. The ICP tool utilizes an RF generator to generate a high frequency plasma or charged gas phase containing microscopic and sub-micron sized particles capable of etching and ashing different types of materials. The ICP etcher is capable of etching/ashing <100nm features to >10 µm precision. The asset is also capable of performing multiple etches and ashes, allowing multiple layers of materials to be etched and ashed in the same run. The wafers are pre-loaded, loaded into the chamber, and the etch and ash processes automatically commence. Once completed, the wafers are unloaded. Furthermore, the model can be integrated with upstream or downstream systems, so as to ensure more consistent process parameters. This further reduces the cycle time of the etching process, compared to traditional etching systems which require individual setup of each process prior to start. The equipment is not only cost effective but also simple to use, enabling users of any experience level to quickly master the etch/ash process. The versatile nature of the system means it can be used for various applications including fine-line etching, passivation, polishing, tapered holes, isotropic etching, and more. Overall, Multiplex ICP is a cost-effective unit that is capable of providing highly uniform and accurate results. The machine utilizes advanced and well known ICP technology to provide a simple, fast, and reliable etching and ashing process. Furthermore, the versatile nature of the tool makes it suitable for multiple applications, allowing users to create accurate, fine-line features and more.