Used STS / CPX Multiplex ICP #9363067 for sale

STS / CPX Multiplex ICP (Inductively Coupled Plasma) is an etcher/asher designed for semiconductor materials processing, with high accuracy and repeatability. It offers a single-wafer etch/ash capability over a broad range of fabrications involving high-aspect-ratio etches and anodic materials. STS Multiplex ICP systems are equipped with dual RF waveguides and multiple process gas inlets with flow rates up to 600 SLM, allowing the user to apply optimized etching and ashing conditions with a single run. The dual-sourced RF plasma creates a homogeneous, balanced ion energy distribution and profile across the entire substrate surface. CPX Multiplex ICP offers an independent RF energy control of the individual RF sources with dual-power generator operation. It supports up to two chamber configurations for a single substrate, to facilitate films with multiple etch or ashing steps with multiple conditions and gases. This equipment can be customized based on the process requirements to offer a wide range of wafer sizes, thicknesses, and materials. An advanced internal shielding system ensures that the RF energy is evenly distributed across the substrate. The unit's user-friendly software provides flexible process control options, enabling the user to customize recipes for each etch or ashing step. The overpressure/vacuum control offers adjustable and precise pressure control and pneumatic isolation of the chambers, ensuring a simple and reliable process across the entire substrate surface. To facilitate the etching and ashing of thin layers, deep trenches, high aspect ratio vias, and high density vias, Multiplex ICP provides a patented Planarization Control Machine (PCS). This technology allows for the uniform etching of multiple layers of materials and the over etching of deep and high aspect ratio features. The tool's wide range of etch and ashing technologies, superior uniformities, and reproducible thin-film results ensure that the user gets the highest quality output every time. STS / CPX Multiplex ICP is the perfect solution for large volume and precision etching and ashing applications.