Used STS Multiplex ICP HR #293622448 for sale

STS Multiplex ICP HR is a robust etcher/asher designed specifically for semiconductor manufacturing and research applications. This highly versatile machine is capable of etching, ashing, and shallow sampling. Multiplex ICP HR is equipped with an advanced multi-zone quartz crystal microbalance (QCM) equipment, cyclonic showerhead, and an automatic wafer handling system. The highly accurate QCM unit allows for precise control of the etching process, ensuring optimal performance for a wide range of materials, from low resistivity to high-k dielectrics. The cyclonic showerhead provides superior etching uniformity, which is especially important for manufacturing of complex structures. In addition, the wafer handling machine enables up to 999 wafers to be processed at one time, and can automatically detect, transport, and index wafers during processes. STS Multiplex ICP HR is designed to operate with a wide range of equipment, allowing users to tailor their processes to the specific requirements of their applications. Its advanced surface mount technology provides a platform for surface site selection control, allowing users to place markers on target locations prior to etching. Additionally, the machine's anisotropic loading facility allows users to accurately set the etching angle during the etching process. Finally, Multiplex ICP HR's multiple functions can be integrated into fully automated traceability systems. This ensures that all processes are performed efficiently, accurately and within the highest quality assurance standards. Overall, STS Multiplex ICP HR etcher/asher provides a robust and highly accurate tool for semiconductor manufacturing and research applications. Its advanced QCM tool, cyclonic showerhead, and wafer handling asset combined with customizable options offer users a versatile and efficient way to etch, ash, and shallow sample their wafers. With its ability to quickly process up to 999 wafers and ensure the highest quality assurance standards, Multiplex ICP HR can greatly increase the efficiency of any etching process.