Used STS Multiplex ICP HR #9272076 for sale
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ID: 9272076
Wafer Size: 6"-8"
Dry etchers, 6"-8"
SI
Advanced Silicon Etch (ASE) With BOSCH Process
MAC Loader
Carousel vacuum load lock
Helium Backside Cooling (HBC)
HBC Assy: ICP V2
Clamp type: Standard WTC
Lower electrode: ICP WTC Tripod lift
No chamber insulation jacket
RF Generators:
ENI GHW-50Z Coil RF Power, 3 kW
ENI ACG-3B Platen RF Power, 13.56 MHz, 300 W
Gases:
C4F8 (200 sccm)
SF6 (1000 sccm)
O2 (2000 sccm)
N2 (500 sccm)
Vacuum system:
Turbo pump: LEYBOLD MAG 2000
Load lock pump: EBARA AA10
Chamber pump: EBARA A30W
AFFINITY PWG-060L-BE27CBD2 Chiller
Power supply: 380 V, 60 Hz, 40 A
2003 vintage.
STS Multiplex ICP HR is a specialized etching and ashing tool that allows users to process multiple substrates or wafers at once. It is easy to use and provides an excellent level of uniformity when it comes to processing a variety of types of substrates and wafers. The device is crafted out of stainless steel and boasts an impressive 2 micron etching accuracy. Its computer-controlled system provides efficient and precise etching processes that can easily be controlled via its built-in recipes. Additionally, the system offers a wide numerical range of recipe settings that allow for a great deal of flexibility when it comes to processing different types of material. The device's hardware integrates an inert quartz chamber that provides improved etching results and raises the flexibility of the etcher. This, coupled with its EtchSlice™ technology, allows for precise and repeatable etching process that is optimized to run with a variety of recipes, such as those that use Bake-n-Quench™ or metal-organic precursors. The ICP HR also features a dynamic sweep control capability, which allows for fast optimization of etch rates. The device also provides a high degree of tolerance for variations in silicone etch rates, which increases its accuracy and precision. Finally, the ICP HR's integrated Environmental Protection Layer (EPL) ensures that any hazardous materials are contained thus making the device environmentally friendly. This easy-to-use device helps control the etching and cleaning process, resulting in a high quality, repeatable etch rate. Multiplex ICP HR makes a great addition to any facility, providing a reliable tool that will help production staff to quickly and accurately etch and ash a wide variety of substrates and wafers. It provides a great degree of control over the etching process, as well as a safe and efficient way to clean up hazardous materials.
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