Used STS MXP Multiplex ICP HR #9005443 for sale
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ID: 9005443
Advanced Silicon Etcher (ASE)
Process: Silicon etch bosch
Capable, 2"-8"
EDWARDS E2M40 Loadlock pump
PFEIFFER MAG 2000 High vacuum pump
EDWARDS IQMB250 Roughing pump
EDWARDS IQDP80 Roughing pump
ENI / ACG-3B RF Generator
ADVANCED ENERGY RFG 3001 RF Generator
Loadlock
(4) Gases
HUBER Unistat Chiller, 140 W
Gases: SF6, O2, Ar, C4F8
Balun coil ICP V2
Mechanical clamp
Helium backside cooling
(2) MkIV MPX Carousel, 6"
Power supply: 3 kW, 300/30 W Platen
Purge gas line
E-Rack modules:
HCL1
HCU3
HCU5
VAC3Y
(2) AMC1
HBC2
Operating system: Windows 2000
Power supply: 400 V, 50 Hz, 40 A, 3-Phase
Configured Power supply: 60 Hz, 208 / 460, 3-Phase
CE Marked
2003 vintage.
STS MXP Multiplex ICP HR is an advanced, high resolution etcher / asher designed for bridging the gap between multiple processes. It takes advantage of high resolution, multiplexing, and ICP (inductively coupled plasma) processes to maximize accuracy, yield, and throughput. The machine's high resolution capabilities are enabled by its state-of-the-art imaging equipment. This system is able to adjust etch resolution depending on the application, allowing for resolutions up to 18um (microns). It also has an automated alignment and process optimization unit to ensure uniformity in etching. The multiplexing process allows for a large amount of wafers to be processed simultaneously, reducing process variation and increasing yield. The ICP process creates a powerful and more consistent etch rate than other etching methods, which is highly beneficial for critical and semiconductor applications. The etcher / asher also comes with excellent hardware features which make it even more powerful. Its large, automated loading machine makes it easier to process multiple wafers in one go. It also comes with a special, enclosed ICP chamber, which keeps the environment dust-free and increases the efficacy of the process. MXP Multiplex ICP HR is also able to be integrated into a cleanroom environment. Its unique setup allows for a higher level of manufacturing process control, making it ideal for precision processes like those found in the fields of semiconductor and medical device production. STS MXP Multiplex ICP HR is an excellent etcher / asher, and is used for a number of different manufacturing processes. Its high resolution, multiplexing, and ICP capabilities make it perfect for applications where precision is key. It is also well suited for clean room environments, and is a perfect choice for any production environment which requires a high degree of process control and accuracy.
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