Used TECHNICS 220-II #9124218 for sale

Manufacturer
TECHNICS
Model
220-II
ID: 9124218
Wafer Size: 4"
Barrel plasma asher (3) Three gas channels with mass flow controllers Stainless steel chamber process up to 4” dia 300 Watt 13.56 MHz power supply Substrates.
TECHNICS 220-II etcher/asher is a user-friendly, high-performance desktop equipment that combines the capabilities of both etching and ashing in one platform. Using a modular design composed of five main modules, it is designed to enable users to produce both circuit and device patterns with high quality and precision at a much lower cost than most commercially available systems. The first module of 220-II etcher/asher is a high speed semiconductor etcher. This etching module offers superior Si: Si etch rates, enabling users to achieve higher levels of etch precision that would be difficult to achieve with other conventional systems. The high throughput of the etching module brings excellent throughput capabilities and improved control over etch depth. The ashing module offers a powerful five-channel RF plasma source that creates high temperature, highly reactive fluxes for an effective and precise ashing operation. The ashing module of TECHNICS 220-II is capable of high temperatures, enabling ashing of various types of materials such as Si, SiO2, SiN, Polyimides, and other polymers and dielectrics. The third module of the system offers a fast and accurate maskless lithography unit. The maskless lithography machine of 220-II uses a high resolution projection tool that provides superior pattern definition capabilities enabling precise definition of devices and patterns. Together with other features such as support for multiple designs, the maskless lithography module offers the user a cost effective solution for completing complex devices. The fourth module of the asset provides an in-line inspection module that is designed to identify and correct device critical defects during lithography operations. The in-line inspection module enables high-speed detection and correction of device critical defects along with the application of pass/fail criteria. Furthermore, the model enables the use of advanced algorithms to improve the accuracy of the inspection. The fifth module of the equipment is a manual robot tool that provides several hardware components necessary for device testing, prototyping, and assembly operations. This tool enables the user to quickly and easily assemble a critical device, which then can be tested to determine device performance. The manual robot tool also offers additional capabilities such as application specific device probing, on-site manipulation and analysis, and fault isolation. In summary, TECHNICS 220-II etcher/asher is an accessible yet powerful system suitable for users wishing to produce both circuit and device patterns with high quality and precision. Through its five main modules, the unit is designed to provide the user with an efficient and affordable solution for their etching and ashing operations.
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